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Physical Vapor Deposition of Thin Films, by John E. Mahan
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A unified treatment of the theories, data, and technologies underlying physical vapor deposition methods With electronic, optical, and magnetic coating technologies increasingly dominating manufacturing in the high-tech industries, there is a growing need for expertise in physical vapor deposition of thin films. This important new work provides researchers and engineers in this field with the information they need to tackle thin film processes in the real world. Presenting a cohesive, thoroughly developed treatment of both fundamental and applied topics, Physical Vapor Deposition of Thin Films incorporates many critical results from across the literature as it imparts a working knowledge of a variety of present-day techniques. Numerous worked examples, extensive references, and more than 100 illustrations and photographs accompany coverage of:
* Thermal evaporation, sputtering, and pulsed laser deposition techniques
* Key theories and phenomena, including the kinetic theory of gases, adsorption and condensation, high-vacuum pumping dynamics, and sputtering discharges
* Trends in sputter yield data and a new simplified collisional model of sputter yield for pure element targets
* Quantitative models for film deposition rate, thickness profiles, and thermalization of the sputtered beam
- Sales Rank: #2679914 in Books
- Published on: 2000-02-01
- Original language: English
- Number of items: 1
- Dimensions: 9.37" h x .88" w x 6.46" l, 1.34 pounds
- Binding: Hardcover
- 336 pages
From the Back Cover
A unified treatment of the theories, data, and technologies underlying physical vapor deposition methods With electronic, optical, and magnetic coating technologies increasingly dominating manufacturing in the high-tech industries, there is a growing need for expertise in physical vapor deposition of thin films. This important new work provides researchers and engineers in this field with the information they need to tackle thin film processes in the real world. Presenting a cohesive, thoroughly developed treatment of both fundamental and applied topics, Physical Vapor Deposition of Thin Films incorporates many critical results from across the literature as it imparts a working knowledge of a variety of present-day techniques. Numerous worked examples, extensive references, and more than 100 illustrations and photographs accompany coverage of:
* Thermal evaporation, sputtering, and pulsed laser deposition techniques
* Key theories and phenomena, including the kinetic theory of gases, adsorption and condensation, high-vacuum pumping dynamics, and sputtering discharges
* Trends in sputter yield data and a new simplified collisional model of sputter yield for pure element targets
* Quantitative models for film deposition rate, thickness profiles, and thermalization of the sputtered beam
About the Author
JOHN E. MAHAN, PhD, is Professor of Electrical Engineering at Colorado State University.
Most helpful customer reviews
0 of 0 people found the following review helpful.
...a practical book
By Joaquín Aarón
This book is more practical than theoretical... It include the basic concepts of vacuum and practical plasmas (like sputering plasma... I like it becouse there are many numerical examples to apply the ecuations and to explain the fundamentals of plasma modelling. It is a basic book
0 of 0 people found the following review helpful.
Very useful text
By Colleen Spiegel
I found this book very useful and practical. It is nice to see a book that balances a good combination of theory and practicality.
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